Pulse discharge in deep oscillatory pulsed magnetron sputtering

Deep oscillation magnetron sputtering (DOMS) can achieve complete elimination of arc discharge and near total ionization of target through a series of modulated voltage micro-pulse oscillation waveforms, to achieve high density, low ion energy and high beam density plasma deposition．This paper reviews technical principles of DOMS and effects of deep oscillatory pulse discharge on spatiotemporal evolution of plasma ion species and ion energy．Influence of DOMS pulse parameters on target ionization process was found to follow the law of voltage time evolution．Target ionization process is found to be phased ionization oscillating with short pulse voltage．